• DocumentCode
    1048204
  • Title

    Annealing effects in plated-wire memory elements, part II: Recrystallization in permalloy films

  • Author

    Marquardt, Shirly J. ; Kench, John R.

  • Author_Institution
    Honeywell Corporate Research Center, Hopkins, Minn.
  • Volume
    7
  • Issue
    4
  • fYear
    1971
  • fDate
    12/1/1971 12:00:00 AM
  • Firstpage
    858
  • Lastpage
    860
  • Abstract
    Results of grain-size measurements in Permalloy platings suggest that recrystallization is possible at temperatures as low as 200°C, but that it is an extremely heterogeneous process. No worthwhile correlation was found to exist between observed grain size and magnetic dispersion in samples aged in the temperature range 180 and 230°C, and it is suggested that the magnetic aging which occurs under these conditions may be due to some other diffusion-controlled process than recrystallization; a process such as chemical homogenization is tentatively preferred.
  • Keywords
    Annealing; Permalloy films; Plated-wire memories; Aging; Annealing; Copper; Electrons; Grain size; NASA; Optical microscopy; Size measurement; Temperature distribution; Wires;
  • fLanguage
    English
  • Journal_Title
    Magnetics, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9464
  • Type

    jour

  • DOI
    10.1109/TMAG.1971.1067239
  • Filename
    1067239