DocumentCode
1048204
Title
Annealing effects in plated-wire memory elements, part II: Recrystallization in permalloy films
Author
Marquardt, Shirly J. ; Kench, John R.
Author_Institution
Honeywell Corporate Research Center, Hopkins, Minn.
Volume
7
Issue
4
fYear
1971
fDate
12/1/1971 12:00:00 AM
Firstpage
858
Lastpage
860
Abstract
Results of grain-size measurements in Permalloy platings suggest that recrystallization is possible at temperatures as low as 200°C, but that it is an extremely heterogeneous process. No worthwhile correlation was found to exist between observed grain size and magnetic dispersion in samples aged in the temperature range 180 and 230°C, and it is suggested that the magnetic aging which occurs under these conditions may be due to some other diffusion-controlled process than recrystallization; a process such as chemical homogenization is tentatively preferred.
Keywords
Annealing; Permalloy films; Plated-wire memories; Aging; Annealing; Copper; Electrons; Grain size; NASA; Optical microscopy; Size measurement; Temperature distribution; Wires;
fLanguage
English
Journal_Title
Magnetics, IEEE Transactions on
Publisher
ieee
ISSN
0018-9464
Type
jour
DOI
10.1109/TMAG.1971.1067239
Filename
1067239
Link To Document