DocumentCode :
104848
Title :
Technology/Circuit/System Co-Optimization and Benchmarking for Multilayer Graphene Interconnects at Sub-10-nm Technology Node
Author :
Chenyun Pan ; Raghavan, Praveen ; Ceyhan, Ahmet ; Catthoor, Francky ; Tokei, Zsolt ; Naeemi, Azad
Author_Institution :
Sch. of Electr. & Comput. Eng., Georgia Inst. of Technol., Atlanta, GA, USA
Volume :
62
Issue :
5
fYear :
2015
fDate :
May-15
Firstpage :
1530
Lastpage :
1536
Abstract :
Based on realistic circuit- and system-level simulations, graphene interconnects are analyzed in terms of multiple material properties, such as the mean free path (MFP), the contact resistance, and the edge roughness. The benchmarking results indicate that the advantage of using graphene interconnects occurs only under certain circumstances. The device-level parameters, including the supply and threshold voltages, and the circuit-level parameters, including the wire length and width, have large impacts on both the delay and energy-delay product (EDP). At the circuit level, one representative circuit, a 32-bit adder, is investigated, where up to 40% and 70% improvements in delay and EDP are observed. At the system-level analysis, an ARM Cortex-M0 processor is synthesized, and placement and routing are performed. After replacing copper interconnects with multilayer graphene interconnects, up to 15% and 22% performance improvements in clock frequency and EDP have been observed. It is also demonstrated that the benefits of using graphene for the ARM core processor are strongly dependent on the quality of the graphene, such as the MFP and the edge roughness.
Keywords :
adders; contact resistance; graphene; integrated circuit interconnections; optimisation; 32-bit adder; ARM Cortex-M0 processor; ARM core processor; EDP; MFP; circuit-level simulations; contact resistance; edge roughness; energy-delay product; mean free path; multilayer graphene interconnects; multiple material properties; supply voltages; system co-optimization; system-level simulations; threshold voltages; Capacitance; Copper; Delays; Graphene; Integrated circuit interconnections; Resistance; Wires; 32-bit adder; ARM core; delay; energy-delay product (EDP); multilayer graphene interconnect; performance; performance.;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/TED.2015.2409875
Filename :
7061953
Link To Document :
بازگشت