DocumentCode :
1048635
Title :
Effects of electrical leakage currents on MEMS reliability and performance
Author :
Shea, Herbert R. ; Gasparyan, Arman ; Chan, Ho Bun ; Arney, Susanne ; Frahm, Robert E. ; López, Daniel ; Jin, Sungho ; McConnell, Robert P.
Author_Institution :
Lucent Technol. Bell Labs., Murray Hill, NJ, USA
Volume :
4
Issue :
2
fYear :
2004
fDate :
6/1/2004 12:00:00 AM
Firstpage :
198
Lastpage :
207
Abstract :
Electrostatically driven MEMS devices commonly operate with electric fields as high at 108 V/m applied across the dielectric between electrodes. Even with the best mechanical design, the electrical design of these devices has a large impact both on performance (e.g., speed and stability) and on reliability (e.g., corrosion and dielectric or gas breakdown). In this paper, we discuss the reliability and performance implications of leakage currents in the bulk and on the surface of the dielectric insulating the drive (or sense) electrodes from one another. Anodic oxidation of poly-silicon electrodes can occur very rapidly in samples that are not hermetically packaged. The accelerating factors are presented along with an efficient early-warning scheme. The relationship between leakage currents and the accumulation of quasistatic charge in dielectrics are discussed, along with several techniques to mitigate charging and the associated drift in electrostatically actuated or sensed MEMS devices. Two key parameters are shown to be the electrode geometry and the conductivity of the dielectric. Electrical breakdown in submicron gaps is presented as a function of packaging gas and electrode spacing. We discuss the tradeoffs involved in choosing gap geometries and dielectric properties that balance performance and reliability.
Keywords :
anodisation; conducting bodies; dielectric properties; electric breakdown; leakage currents; micromechanical devices; semiconductor device reliability; MEMS performance; MEMS reliability; anodic oxidation; charge dissipation layer; dielectric charging; dielectric conductivity; dielectric properties; electric fields; electrical breakdown; electrical design; electrical leakage currents; electrode geometry; electrode spacing; gap geometries; hermetic packaging; packaging gas; polysilicon electrodes; quasistatic charge; submicron gaps; Corrosion; Dielectric breakdown; Dielectric devices; Electrodes; Geometry; Leakage current; Microelectromechanical devices; Micromechanical devices; Packaging; Stability; Anodic oxidation; MEMS reliability; charge dissipation layer; dielectric charging;
fLanguage :
English
Journal_Title :
Device and Materials Reliability, IEEE Transactions on
Publisher :
ieee
ISSN :
1530-4388
Type :
jour
DOI :
10.1109/TDMR.2004.826350
Filename :
1318625
Link To Document :
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