• DocumentCode
    1048657
  • Title

    Emerging SiGe HBT reliability issues for mixed-signal circuit applications

  • Author

    Cressler, John D.

  • Author_Institution
    Sch. of Electr. & Comput. Eng., Georgia Inst. of Technol., Atlanta, GA, USA
  • Volume
    4
  • Issue
    2
  • fYear
    2004
  • fDate
    6/1/2004 12:00:00 AM
  • Firstpage
    222
  • Lastpage
    236
  • Abstract
    We review the emerging reliability issues associated with high-performance SiGe HBT technologies which are being increasingly deployed in a wide variety of mixed-signal circuit applications. For the purposes of this work, we define the concept of device "reliability" to be broader than its standard usage in the industry, to include all possible transistor degradation mechanisms, for all possible mixed-signal circuit designs, in any of the various intended mixed-signal applications. For instance, in addition to classical device reliability mechanisms associated with reverse emitter-base and high forward current density stress, new reliability issues for SiGe HBTs, including impact-ionization induced "mixed-mode" stress, scaling-induced breakdown voltage compression and operating point instabilities, geometrical scaling-induced low-frequency noise variations, and the impact of ionizing radiation on device and circuit reliability, are also addressed.
  • Keywords
    Ge-Si alloys; heterojunction bipolar transistors; integrated circuit noise; mixed analogue-digital integrated circuits; radiation effects; semiconductor device reliability; stress effects; SiGe; SiGe HBT reliability issues; breakdown voltage compression; circuit reliability; current density stress; device reliability; ionizing radiation; low-frequency noise variations; mixed-mode stress; mixed-signal circuit applications; mixed-signal circuit designs; operating point instabilities; radiation effects; reverse emitter-base; transistor degradation mechanisms; BiCMOS integrated circuits; CMOS analog integrated circuits; CMOS digital integrated circuits; CMOS process; CMOS technology; Germanium silicon alloys; Heterojunction bipolar transistors; Integrated circuit technology; Silicon germanium; Stress; Breakdown; HBT; SiGe; mixed-signal; noise; radiation effects; reliability;
  • fLanguage
    English
  • Journal_Title
    Device and Materials Reliability, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    1530-4388
  • Type

    jour

  • DOI
    10.1109/TDMR.2004.826587
  • Filename
    1318627