• DocumentCode
    1049876
  • Title

    Second breakdown of IC structured power transistors

  • Author

    Demizu, Kiyoshi ; Yamamoto, Yoshimichi

  • Author_Institution
    Mitsubishi Electric Corporation, Itami, Japan
  • Volume
    22
  • Issue
    6
  • fYear
    1975
  • fDate
    6/1/1975 12:00:00 AM
  • Firstpage
    352
  • Lastpage
    353
  • Abstract
    The authors attempt to characterize second breakdown as heating phenomena which can occur in one of two places, either at the p-n interface at low current or at the n-n+interface at higher current. The transition point between these two states occurs at a current It= qVsatNDS where the n-region field is uniform and at a voltage Vt= εsatWepijust necessary to saturate the drift velocity in Wepi.
  • Keywords
    Conductivity; Electric breakdown; Electric resistance; Electron mobility; Electronic ballasts; Epitaxial layers; Power transistors; Semiconductor process modeling; Temperature; Voltage;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/T-ED.1975.18136
  • Filename
    1477971