DocumentCode
1049876
Title
Second breakdown of IC structured power transistors
Author
Demizu, Kiyoshi ; Yamamoto, Yoshimichi
Author_Institution
Mitsubishi Electric Corporation, Itami, Japan
Volume
22
Issue
6
fYear
1975
fDate
6/1/1975 12:00:00 AM
Firstpage
352
Lastpage
353
Abstract
The authors attempt to characterize second breakdown as heating phenomena which can occur in one of two places, either at the p-n interface at low current or at the n-n+interface at higher current. The transition point between these two states occurs at a current It = qVsat ND S where the n-region field is uniform and at a voltage Vt = εsat Wepi just necessary to saturate the drift velocity in Wepi .
Keywords
Conductivity; Electric breakdown; Electric resistance; Electron mobility; Electronic ballasts; Epitaxial layers; Power transistors; Semiconductor process modeling; Temperature; Voltage;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/T-ED.1975.18136
Filename
1477971
Link To Document