DocumentCode
1049993
Title
Pathways in device lithography
Author
Gordon, Eugene I. ; Herriott, Donald R.
Author_Institution
Bell Laboratories, Murray Hill, N. J.
Volume
22
Issue
7
fYear
1975
fDate
7/1/1975 12:00:00 AM
Firstpage
371
Lastpage
375
Abstract
A brief review is given of approaches to lithography for microdevice fabrication. Exposure systems in common use, as well as those in development, are described and assessed. These include contact and proximity printing, stationary and scanning projection printing, step-and-repeat reduction printing, scanning electron beam systems, electron imaging systems, and X-ray systems.
Keywords
Circuit testing; Electron beams; Fabrication; Helium; Integrated circuit technology; Lithography; Optical imaging; Printing; Silicon; X-ray imaging;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/T-ED.1975.18147
Filename
1477982
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