Title :
Pathways in device lithography
Author :
Gordon, Eugene I. ; Herriott, Donald R.
Author_Institution :
Bell Laboratories, Murray Hill, N. J.
fDate :
7/1/1975 12:00:00 AM
Abstract :
A brief review is given of approaches to lithography for microdevice fabrication. Exposure systems in common use, as well as those in development, are described and assessed. These include contact and proximity printing, stationary and scanning projection printing, step-and-repeat reduction printing, scanning electron beam systems, electron imaging systems, and X-ray systems.
Keywords :
Circuit testing; Electron beams; Fabrication; Helium; Integrated circuit technology; Lithography; Optical imaging; Printing; Silicon; X-ray imaging;
Journal_Title :
Electron Devices, IEEE Transactions on
DOI :
10.1109/T-ED.1975.18147
