DocumentCode :
1050073
Title :
Electron sensitive resists derived from vinylether-maleic anhydride copolymers
Author :
Cole, Herbert S. ; Skelly, David W. ; Wagner, Bernard C.
Author_Institution :
General Electric Company, Schenectady, N. Y.
Volume :
22
Issue :
7
fYear :
1975
fDate :
7/1/1975 12:00:00 AM
Firstpage :
417
Lastpage :
420
Abstract :
A series of polymers derived from vinylether-maleic anhydride copolymers were prepared and their electron sensitivities measured. One of the most sensitive polymers prepared was the allyl half-ester of an octadecylvinylether maleic anhydride copolymer (VL-100). This material was stable, formed excellent films, and was insensitive to UV and visible light with λ > 2000 Å. The sensitivity to electron irradiation was found to be 4 × 10-8C/cm2at 9 keV compared to 5 × 10-7for KTFR under identical conditions. The evaluation of this material as an electron resist as well as sensitivity data for numerous derivatives is reported.
Keywords :
Argon; Electron beams; Electron optics; Etching; Helium; Inorganic materials; Optical design; Optical materials; Polymers; Resists;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/T-ED.1975.18154
Filename :
1477989
Link To Document :
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