• DocumentCode
    1050073
  • Title

    Electron sensitive resists derived from vinylether-maleic anhydride copolymers

  • Author

    Cole, Herbert S. ; Skelly, David W. ; Wagner, Bernard C.

  • Author_Institution
    General Electric Company, Schenectady, N. Y.
  • Volume
    22
  • Issue
    7
  • fYear
    1975
  • fDate
    7/1/1975 12:00:00 AM
  • Firstpage
    417
  • Lastpage
    420
  • Abstract
    A series of polymers derived from vinylether-maleic anhydride copolymers were prepared and their electron sensitivities measured. One of the most sensitive polymers prepared was the allyl half-ester of an octadecylvinylether maleic anhydride copolymer (VL-100). This material was stable, formed excellent films, and was insensitive to UV and visible light with λ > 2000 Å. The sensitivity to electron irradiation was found to be 4 × 10-8C/cm2at 9 keV compared to 5 × 10-7for KTFR under identical conditions. The evaluation of this material as an electron resist as well as sensitivity data for numerous derivatives is reported.
  • Keywords
    Argon; Electron beams; Electron optics; Etching; Helium; Inorganic materials; Optical design; Optical materials; Polymers; Resists;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/T-ED.1975.18154
  • Filename
    1477989