Reduction of photoresist standing-wave effects by post-exposure bake

Author

Walker, E.J.

Volume

Issue

fYear

1975

fDate

7/1/1975 12:00:00 AM

Firstpage

464

Lastpage

466

Abstract

A process is described for reducing the residual effects of standing waves upon exposed and developed lines in positive photoresist films.

Keywords

Cameras; Cities and towns; Interference; Lenses; Lighting; Optical films; Resists; Shape control; Substrates; Temperature;

fLanguage

English

Journal_Title

Electron Devices, IEEE Transactions on

Publisher

ieee

ISSN

0018-9383

Type

DOI

10.1109/T-ED.1975.18162

Filename

1477997

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