Title :
Reduction of photoresist standing-wave effects by post-exposure bake
fDate :
7/1/1975 12:00:00 AM
Abstract :
A process is described for reducing the residual effects of standing waves upon exposed and developed lines in positive photoresist films.
Keywords :
Cameras; Cities and towns; Interference; Lenses; Lighting; Optical films; Resists; Shape control; Substrates; Temperature;
Journal_Title :
Electron Devices, IEEE Transactions on
DOI :
10.1109/T-ED.1975.18162
