Title :
Shallow junctions on pillar sidewalls for sub-100-nm vertical MOSFETs
Author :
Gili, Enrico ; Uchino, Takashi ; Hakim, M.M.A. ; de Groot, C.H. ; Buiu, Octavian ; Hall, Steve ; Ashburn, Peter
Author_Institution :
Sch. of Electron. & Comput. Sci., Southampton Univ.
Abstract :
A simple process for the fabrication of shallow drain junctions on pillar sidewalls in sub-100-nm vertical MOSFETs is described. The key feature of this process is the creation of a polysilicon spacer around the perimeter of the pillar to connect the channel to a polysilicon drain contact. The depth of the junction on the pillar sidewall is primarily determined by the thickness of the polysilicon spacer. This process is CMOS compatible and, hence, facilitates the integration of a sub-100-nm vertical MOSFET in a planar CMOS technology using mature lithography. The fabricated transistors have a subthreshold slope of 95 mV/dec (at VDS=1 V) and a drain-induced barrier lowering of 0.12 V
Keywords :
MOSFET; diffusion; 100 nm; CMOS technology; diffusion; drain-induced barrier lowering; lithography; pillar sidewalls; polysilicon drain contact; polysilicon spacer; shallow drain junctions; vertical MOSFET; Anisotropic magnetoresistance; CMOS process; CMOS technology; Dry etching; Epitaxial growth; Fabrication; Ion implantation; Lithography; MOSFETs; Plasma applications; Diffusion; drain-induced barrier lowering (DIBL); junction; vertical MOSFET;
Journal_Title :
Electron Device Letters, IEEE
DOI :
10.1109/LED.2006.879031