• DocumentCode
    1050329
  • Title

    Approximate solution for the redistribution of impurities during second oxidation

  • Author

    Chakrabarti, Utpal K.

  • Author_Institution
    Indian Institute of Science, Bangalore, India
  • Volume
    22
  • Issue
    8
  • fYear
    1975
  • fDate
    8/1/1975 12:00:00 AM
  • Firstpage
    566
  • Lastpage
    568
  • Abstract
    The impurity profile for the second oxidation, used in MOST fabrication, has been obtained by Margalit et al. [1]. The disadvantage of this technique is that the accuracy of their solution is directly dependent on the computer time. In this article, an analytical solution is presented using the approximation of linearizing the second oxidation procedure.
  • Keywords
    Boundary conditions; Differential equations; Fabrication; Green´s function methods; Impurities; Linear approximation; Oxidation; Partial differential equations; Silicon; Trade agreements;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/T-ED.1975.18178
  • Filename
    1478013
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=1050329