DocumentCode :
105148
Title :
Analysis of Graphene Tunnel Field-Effect Transistors for Analog/RF Applications
Author :
Rawat, Brajesh ; Paily, Roy
Author_Institution :
Dept. of Electron. & Electr. Eng., IIT Guwahati, Guwahati, India
Volume :
62
Issue :
8
fYear :
2015
fDate :
Aug. 2015
Firstpage :
2663
Lastpage :
2669
Abstract :
The recent findings of quasi-saturation and negative differential resistance in graphene FET have motivated the researchers to improve the current saturation behavior. We suggest that tunnel FET (TFET) with graphene can be a potential candidate for better current saturation. In this regard, the electronic transport in zero bandgap graphene TFET (T-GFET) is studied through the self-consistent solution of Schrödinger equation within ballistic nonequilibrium Green´s function formalism, and 2-D Poisson´s equation. We show that the appropriate drain overlap, and channel and drain doping concentrations in T-GFET can significantly suppress the channel to drain tunneling current and, consequently, enhance the current saturation. Despite T-GFET´s lower ON-current, it shows moderately higher intrinsic gain, compared with conventional graphene FET (C-GFET). Furthermore, the channel length dependence of intrinsic gain and cutoff frequency for T-GFET is investigated and compared with C-GFET.
Keywords :
Green´s function methods; Poisson equation; Schrodinger equation; field effect transistors; graphene devices; semiconductor doping; tunnel transistors; 2D Poisson equation; RF applications; Schrödinger equation; analog applications; channel doping concentration; conventional graphene FET; cutoff frequency; drain doping concentration; drain overlap; electronic transport; graphene tunnel field-effect transistors; nonequilibrium Greens function formalism; self-consistent solution; zero bandgap graphene TFET; Doping; Graphene; Logic gates; Potential energy; Radio frequency; Resistance; Tunneling; Cutoff frequency; doping engineering; drain overlap; drain underlap; graphene tunnel FET (T-GFET); intrinsic gain; quasi-saturation; scaling behavior; scaling behavior.;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/TED.2015.2441092
Filename :
7128361
Link To Document :
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