DocumentCode :
1051791
Title :
Determination of Density of States in Amorphous Carbon
Author :
Paul, S.
Author_Institution :
Emerging Technol. Res. Centre, De Montfort Univ., Leicester
Volume :
53
Issue :
8
fYear :
2006
Firstpage :
1775
Lastpage :
1781
Abstract :
Various methods have been employed before to deduce the density of states (DOS) in amorphous carbon. However, further investigations show that capacitance measurements on a metal-insulator-semiconductor structure are an appropriate way to deduce the DOS. Thus, an analytical formalism, which agrees well with the experimental data, is developed. This paper reports the structures and techniques used to investigate the DOS in amorphous hydrogenated carbon
Keywords :
MIS structures; amorphous semiconductors; carbon compounds; electronic density of states; amorphous hydrogenated carbon; capacitance measurements; density of states; metal-insulator-semiconductor; Amorphous materials; Capacitance measurement; Delay; Frequency; Helium; Paramagnetic resonance; Photonic band gap; Schottky diodes; Semiconductor materials; Space charge; Amorphous hydrogenated carbon; capacitance-voltage; density of states; metal–insulator–semiconductor structures;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/TED.2006.877868
Filename :
1661877
Link To Document :
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