Title :
CMOS-SOI platform for monolithic integration of crystalline silicon MEMS
Author :
Villarroya, M. ; Figueras, E. ; Verd, J. ; Teva, J. ; Abadal, G. ; Pérez-Murano, F. ; Montserrat, J. ; Uranga, A. ; Esteve, J. ; Barniol, N.
Author_Institution :
Dept. of Electron. Eng., Univ. Autonoma de Barcelona, Bellaterra, Spain
fDate :
7/6/2006 12:00:00 AM
Abstract :
A new platform for the fabrication of crystalline micro- and nano-electromechanical systems fully integrable with CMOS is presented. A pre-CMOS process on SOI wafers allows bulk silicon areas for standard CMOS processing and areas with a stack layer of silicon and silicon oxide to be obtained, in which a set of microelectromechanical devices can be fabricated. An integrated resonant beam system with electrical actuation and detection fabricated according to the presented approach is provided.
Keywords :
CMOS integrated circuits; micromechanical devices; nanoelectronics; silicon-on-insulator; CMOS-SOI platform; SOI wafers; crystalline silicon MEMS; electrical actuation; electrical detection; integrated resonant beam system; microelectromechanical systems; monolithic integration; nanoelectromechanical systems;
Journal_Title :
Electronics Letters
DOI :
10.1049/el:20061097
