DocumentCode :
1052886
Title :
2-D simulation of interface properties of a polysilicon-contacted BJT: is there a residual potential barrier after the oxide is broken?
Author :
Egley, J.L.
Author_Institution :
Integrated Technol. Lab., IBM Corp., Rochester, MN, USA
Volume :
41
Issue :
2
fYear :
1994
fDate :
2/1/1994 12:00:00 AM
Firstpage :
217
Lastpage :
220
Abstract :
Two dimensional simulations were performed on a poly-contacted bipolar, studying the effects of changing the size of broken sections of the “oxide” on the base current. Previous simulations (Egley et al. 1991) used sections which were ~250 Å in length, while the simulations presented here use ~50 Å sections, closer to what was observed from TEM by Wolstenholme et al. (1987). The smaller gaps provide a substantially more rapid increase in base current with percentage oxide broken than found with the 250 Å sections. This extremely rapid rise in base current with the percentage oxide broken is not observed experimentally. It is proposed that a residual barrier remains after a section of the oxide is removed. This potential energy barrier would arise from the grain boundary itself and from the possible presence of electrically active As there
Keywords :
bipolar transistors; elemental semiconductors; grain boundaries; interface electron states; semiconductor device models; silicon; 2-D simulation; 50 A; Si-SiO2; base current; broken sections; electrically active As; grain boundary; interface properties; oxide; poly-contacted bipolar; polysilicon-contacted BJT; potential energy barrier; residual potential barrier; two dimensional simulations; Analytical models; Annealing; Contacts; Distribution functions; Grain boundaries; Helium; Insulation; Potential energy; Silicon; Temperature;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/16.277376
Filename :
277376
Link To Document :
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