DocumentCode :
1052922
Title :
The influence of emitter-base junction design on collector saturation current, ideality factor, Early voltage, and device switching speed of Si/SiGe HBT´s
Author :
Gruhle, Andreas
Author_Institution :
Res. Center, Daimler-Benz AG, Ulm, Germany
Volume :
41
Issue :
2
fYear :
1994
fDate :
2/1/1994 12:00:00 AM
Firstpage :
198
Lastpage :
203
Abstract :
In advanced Si/SiGe HBT´s the base is doped much higher than emitter and collector. Base outdiffusion becomes a problem because of the formation of parasitic barriers that degrade device performance. The simulations and experiments of this paper show that a strong correlation exists between (a) the drop of the collector saturation current, (b) an increase of its ideality factor and (c) a rise of the switching time due to an additional emitter delay which can no longer be neglected. Curves of these three parameters as a function of Si/SiGe heterointerface position and outdiffusion at the base-emitter interface have been calculated and indicate that only a few nm shift may cause severe device degradation. An important result is that the collector current ideality factor or the inverse Early voltage is a very sensitive indicator for the quality of the emitter-base interface. Application of these results have yielded experimental SiGe HBT´s with transit frequencies above 60 GHz
Keywords :
Ge-Si alloys; elemental semiconductors; heterojunction bipolar transistors; semiconductor switches; silicon; solid-state microwave devices; 60 GHz; Early voltage; Si-SiGe; Si/SiGe HBT; Si/SiGe heterointerface position; additional emitter delay; base outdiffusion; base-emitter interface; collector; collector saturation current; device degradation; device switching speed; doping; emitter; emitter-base junction design; ideality factor; inverse Early voltage; parasitic barriers; quality; simulations; transit frequencies; Added delay; Computer interfaces; Degradation; Delay effects; Frequency; Germanium silicon alloys; Heterojunction bipolar transistors; Leakage current; Silicon germanium; Voltage;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/16.277379
Filename :
277379
Link To Document :
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