• DocumentCode
    105363
  • Title

    Electrically Driven Single Pyramid InGaN/GaN Micro Light-Emitting Diode Grown on Silicon Substrate

  • Author

    Weijie Chen ; Guoheng Hu ; Jianliang Jiang ; Minggang Liu ; Yibin Yang ; Peng Xiang ; Gangwei Hu ; Yan Lin ; Zhisheng Wu ; Yang Liu ; Baijun Zhang

  • Author_Institution
    State Key Lab. of Optoelectron. Mater. & Technol., Sun Yat-sen Univ., Guangzhou, China
  • Volume
    11
  • Issue
    3
  • fYear
    2015
  • fDate
    Mar-15
  • Firstpage
    285
  • Lastpage
    291
  • Abstract
    Electrically driven single-pyramid InGaN/GaN micro light-emitting diode ( μ-LED) on silicon substrate has been fabricated and investigated. The μ-LED exhibits a typical p-n diode behavior with a turn-on voltage of 2.5 V and realizes an efficient electroluminescence (EL) under an ultra-small injection current (3 μA). An excellent EL pattern with a high-brightness spot at apex, a hexagonal blue ring around the base of pyramid, and six bright spots at the corners of pyramid base was observed. EL wavelength centered at about 450 nm, and a slight peak shift was found as the injection current increased from 100 to 1000 μA. The small magnitude of spectral shift is attributed to the growth of multiple quantum wells on semi-polar GaN pyramid side facets and its accompanied reduction of the quantum-confined Stark effect. The μ-LED has the promising potential for applying in micro display and electrically driven single photon emitter.
  • Keywords
    III-V semiconductors; electroluminescence; gallium compounds; indium compounds; light emitting diodes; quantum confined Stark effect; semiconductor quantum wells; spectral line shift; wide band gap semiconductors; InGaN-GaN; Si; current 100 muA to 1000 muA; electrically driven single pyramid microlight-emitting diode; electroluminescence; hexagonal blue ring; high-brightness spot; multiple quantum wells; p-n diode behavior; quantum-confined Stark effect; semipolar pyramid side facets; silicon substrate; spectral shift; turn-on voltage; ultra-small injection current; voltage 2.5 V; Aluminum gallium nitride; Gallium nitride; Light emitting diodes; Photonics; Quantum well devices; Silicon; Substrates; GaN; InGaN; light-emitting diodes (LEDs); microstructure; selective area growth (SAG); semi-polar;
  • fLanguage
    English
  • Journal_Title
    Display Technology, Journal of
  • Publisher
    ieee
  • ISSN
    1551-319X
  • Type

    jour

  • DOI
    10.1109/JDT.2014.2385091
  • Filename
    6994801