Title :
Optimal summation of Gaussians for ion implantation profile control
Author :
Zaremba, A.J. ; Marcyk, G.T. ; Streetman, B.G.
Author_Institution :
Hewlett-Packard Company, Santa Rosa, CA
fDate :
2/1/1977 12:00:00 AM
Abstract :
A method is described for selecting appropriate ion implantation energies and fluences to synthesize desired impurity profiles in semiconductor device fabrication. An optimization routine utilizing Rosenbrock´s algorithm allows computation of a set of implantation parameters which result in close approximation to the preselected distribution.
Keywords :
Computer errors; Gaussian approximation; Gaussian distribution; Gaussian processes; Implants; Ion implantation; Optimal control; Power system harmonics; Semiconductor devices; Semiconductor impurities;
Journal_Title :
Electron Devices, IEEE Transactions on
DOI :
10.1109/T-ED.1977.18699
