DocumentCode :
1055689
Title :
Remarks on transmission characteristics of positive photoresists
Author :
Andrási, M.
Author_Institution :
The Research Institute for Technical Physics of the Hungarian Academy of Scinces, Budapest, Hungary
Volume :
24
Issue :
2
fYear :
1977
fDate :
2/1/1977 12:00:00 AM
Firstpage :
170
Lastpage :
172
Abstract :
The transmission characteristics of positive photoresists in connection with contact photoresist procedure are considered. The use of monochromatic illumination with wavelengths over 400 nm is suggested.
Keywords :
Bleaching; Glass; Holography; Lighting; Microelectronics; Optical materials; Physics; Resists; Temperature; Wavelength measurement;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/T-ED.1977.18703
Filename :
1478895
Link To Document :
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