DocumentCode
1055868
Title
Investigation of Water-Vapor Plasma Excited by Microwaves as Ultraviolet Light Source
Author
Oh, Jun-Seok ; Kawamura, Kazumasa ; Pramanik, Bimal K. ; Hatta, Akimitsu
Author_Institution
JST Innovation Satellite Kochi, Kochi Univ. of Technol., Kami
Volume
37
Issue
1
fYear
2009
Firstpage
107
Lastpage
112
Abstract
The potential of using water-vapor plasmas excited by microwaves as a ultraviolet (UV) light source has been investigated by using various pressures and input powers. The UV irradiation power increased and saturated at a pressure range dependent on the input power. On the other hand, other visible and infrared emissions corresponding to four atomic lines, i.e., the Balmer series of hydrogen at 486.1 nm ( Hbeta) and 656.3 nm (Halpha) and oxygen atoms at 777.2 and 844.6 nm, were clearly decreased with an increase in the total gas pressure. It was found that pressures (1.4-2.0 kPa) near the saturated water-vapor pressure were found to give the most intense UV irradiation. With a vapor pressure of 1.6 kPa and a total microwave power of 300 W, the power density of UV (Gammauv) was measured to be 10.5 muWmiddotcm-2 at a distance of 30 cm from the center of the discharge tube as measured through an optical viewing port on the cavity discharge applicator. This value for (Gammauv) is comparable to that for a mercury lamp. However, the (etauv) efficiency was estimated to be considerably lower than that of a mercury lamp.
Keywords
discharges (electric); free radicals; hydrogen; oxygen; oxygen compounds; plasma pressure; plasma radiofrequency heating; ultraviolet sources; water; Balmer series; H; H2O; O; OH; OH radical; UV irradiation power; absolute spectrum calibration; cavity discharge applicator; discharge tube; infrared emission; mercury lamp; optical emission spectroscopy; plasma heating by microwaves; rotational temperature; saturated water-vapor pressure; total gas pressure; ultraviolet light source; visible emission; water-vapor plasma; wavelength 486.1 nm; wavelength 656.3 nm; wavelength 777.2 nm; wavelength 844.6 nm; Density measurement; Electron tubes; Hydrogen; Lamps; Light sources; Microwave measurements; Optical saturation; Plasma sources; Power measurement; Pressure measurement; Absolute spectrum calibration; OH radical; microwave; optical-emission spectroscopy (OES); rotational temperature; saturated water-vapor pressure; ultraviolet (UV); water-vapor discharge;
fLanguage
English
Journal_Title
Plasma Science, IEEE Transactions on
Publisher
ieee
ISSN
0093-3813
Type
jour
DOI
10.1109/TPS.2008.2007732
Filename
4735621
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