DocumentCode
1056389
Title
Ion kinetics in low-pressure, electropositive, RF glow discharge sheaths
Author
Barnes, Michael S. ; Forster, John C. ; Keller, John H.
Author_Institution
IBM East Fishkill, Hopewell Junction, NY, USA
Volume
19
Issue
2
fYear
1991
fDate
4/1/1991 12:00:00 AM
Firstpage
240
Lastpage
244
Abstract
Ion kinetics in low-pressure (e.g., 1 mtorr), electropositive, RF glow discharge sheaths are studied using a Monte-Carlo-based computer simulation. The numerical model integrates particle trajectories using a spatially nonlinear, time-varying model of the electric field in the RF sheath. A scaling relationship is then discussed, relating the normalized ion energy spread to the ratio of ion sheath transit time to the RF period. The scaled numerical data shows good agreement with existing numerical and experimental data
Keywords
Monte Carlo methods; glow discharges; high-frequency discharges; plasma kinetic theory; plasma sheaths; plasma simulation; 1 mtorr; Monte-Carlo-based computer simulation; ion energy spread; ion kinetics; ion sheath transit time; low-pressure electropositive RF glow discharge sheaths; particle trajectories; Computer simulation; Equations; Glow discharges; Kinetic theory; Plasma applications; Plasma materials processing; Plasma sheaths; Radio frequency; Sputter etching; Substrates;
fLanguage
English
Journal_Title
Plasma Science, IEEE Transactions on
Publisher
ieee
ISSN
0093-3813
Type
jour
DOI
10.1109/27.106819
Filename
106819
Link To Document