Title :
Ion kinetics in low-pressure, electropositive, RF glow discharge sheaths
Author :
Barnes, Michael S. ; Forster, John C. ; Keller, John H.
Author_Institution :
IBM East Fishkill, Hopewell Junction, NY, USA
fDate :
4/1/1991 12:00:00 AM
Abstract :
Ion kinetics in low-pressure (e.g., 1 mtorr), electropositive, RF glow discharge sheaths are studied using a Monte-Carlo-based computer simulation. The numerical model integrates particle trajectories using a spatially nonlinear, time-varying model of the electric field in the RF sheath. A scaling relationship is then discussed, relating the normalized ion energy spread to the ratio of ion sheath transit time to the RF period. The scaled numerical data shows good agreement with existing numerical and experimental data
Keywords :
Monte Carlo methods; glow discharges; high-frequency discharges; plasma kinetic theory; plasma sheaths; plasma simulation; 1 mtorr; Monte-Carlo-based computer simulation; ion energy spread; ion kinetics; ion sheath transit time; low-pressure electropositive RF glow discharge sheaths; particle trajectories; Computer simulation; Equations; Glow discharges; Kinetic theory; Plasma applications; Plasma materials processing; Plasma sheaths; Radio frequency; Sputter etching; Substrates;
Journal_Title :
Plasma Science, IEEE Transactions on
