DocumentCode
1056459
Title
MNOS LSI memory device data retention measurements and projections
Author
Hsia, Yukun
Author_Institution
McDonnell Douglas Corporation, Monrovia, CA
Volume
24
Issue
5
fYear
1977
fDate
5/1/1977 12:00:00 AM
Firstpage
568
Lastpage
577
Abstract
The retention characteristics of an MNOS LSI memory device are interpreted from the properties of its basic MNOS transistor. A technique is developed for measuring and predicting retention properties of large quantity device lots. A production lot test method for determining the 10 000-h data retention properties of LSI memory devices is proposed. Also included in the paper are measured failure rates, identifying the retention failures and reliability for a specific LSI memory device.
Keywords
Large scale integration; Manufacturing; Nonvolatile memory; Packaging; Pins; Production; Random access memory; Read-write memory; Testing; Writing;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/T-ED.1977.18780
Filename
1478972
Link To Document