• DocumentCode
    1056623
  • Title

    Effect of optical radiation and surface recombination on the RF switching parameters of a GaAs MESFET

  • Author

    Singh, V.K. ; Pal, B.B.

  • Author_Institution
    Inst. of Technol., Banaras Hindu Univ., Varanasi, India
  • Volume
    137
  • Issue
    2
  • fYear
    1990
  • fDate
    4/1/1990 12:00:00 AM
  • Firstpage
    124
  • Lastpage
    128
  • Abstract
    The study shows that the internal gate source capacitance increases with increasing radiation flux density under enhancement mode, and decreases under depletion mode. However, the surface recombination slightly reduces these effects. Further, the drain source resistance ( Rds) reduces with increasing radiation flux density at a particular trap centre density and increases with increasing surface trap density at a fixed flux density. It is also observed that the RC time constant decreases with increasing trap densities at a fixed flux density and absorption coefficient. The variation with doping density is also found to be of a decreasing nature for different flux densities and trap centre densities. At a fixed doping density, RC time constant is higher for higher flux density and lower trap density
  • Keywords
    III-V semiconductors; Schottky gate field effect transistors; electron-hole recombination; gallium arsenide; semiconductor switches; surface electron states; GaAs; GaAs MESFET; III-V semiconductor; RC time constant; RF switching parameters; absorption coefficient; depletion mode; doping density; drain source resistance; enhancement mode; internal gate source capacitance; optical radiation; radiation flux density; surface recombination; surface trap density; trap centre density;
  • fLanguage
    English
  • Journal_Title
    Optoelectronics, IEE Proceedings J
  • Publisher
    iet
  • ISSN
    0267-3932
  • Type

    jour

  • Filename
    50646