DocumentCode
1056623
Title
Effect of optical radiation and surface recombination on the RF switching parameters of a GaAs MESFET
Author
Singh, V.K. ; Pal, B.B.
Author_Institution
Inst. of Technol., Banaras Hindu Univ., Varanasi, India
Volume
137
Issue
2
fYear
1990
fDate
4/1/1990 12:00:00 AM
Firstpage
124
Lastpage
128
Abstract
The study shows that the internal gate source capacitance increases with increasing radiation flux density under enhancement mode, and decreases under depletion mode. However, the surface recombination slightly reduces these effects. Further, the drain source resistance ( R ds) reduces with increasing radiation flux density at a particular trap centre density and increases with increasing surface trap density at a fixed flux density. It is also observed that the RC time constant decreases with increasing trap densities at a fixed flux density and absorption coefficient. The variation with doping density is also found to be of a decreasing nature for different flux densities and trap centre densities. At a fixed doping density, RC time constant is higher for higher flux density and lower trap density
Keywords
III-V semiconductors; Schottky gate field effect transistors; electron-hole recombination; gallium arsenide; semiconductor switches; surface electron states; GaAs; GaAs MESFET; III-V semiconductor; RC time constant; RF switching parameters; absorption coefficient; depletion mode; doping density; drain source resistance; enhancement mode; internal gate source capacitance; optical radiation; radiation flux density; surface recombination; surface trap density; trap centre density;
fLanguage
English
Journal_Title
Optoelectronics, IEE Proceedings J
Publisher
iet
ISSN
0267-3932
Type
jour
Filename
50646
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