DocumentCode
1057432
Title
Characteristics of the Gallium-doped infrared sensing MOSFET (IRFET)
Author
Loh, K.W. ; Hawkins, Bobby M. ; Elabd, Hamman ; Forbes, Leonard
Author_Institution
Westinghouse Research Laboratories, Pittsburgh, PA
Volume
24
Issue
8
fYear
1977
fDate
8/1/1977 12:00:00 AM
Firstpage
1041
Lastpage
1048
Abstract
Gallium-doped infrared sensing MOSFET´s have been operated in the far infrared, 8- to 14-µm wavelength region with a quantum efficiency of 2.8 percent and a responsivity of 3.5 × 103A/J. A strong field enhancement has been observed in both thermal and optical emission of holes from the neutral gallium center in silicon. Application considerations in large-scale infrared imaging arrays are discussed.
Keywords
Doping; Equations; Gallium compounds; Helium; Impurities; Infrared detectors; Intrusion detection; MOSFET circuits; Silicon; Temperature;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/T-ED.1977.18875
Filename
1479067
Link To Document