DocumentCode
105744
Title
A Novel Trench-Gated Power MOSFET With Reduced Gate Charge
Author
Ying Wang ; Yan-Juan Liu ; Cheng-Hao Yu ; Fei Cao
Author_Institution
Coll. of Inf. & Commun. Eng., Harbin Eng. Univ., Harbin, China
Volume
36
Issue
2
fYear
2015
fDate
Feb. 2015
Firstpage
165
Lastpage
167
Abstract
In this letter, we propose a novel trench power MOSFET structure with a p-n junction in trench to reduce the gate charge. We utilize the 2-D device simulator, ATLAS, to investigate the characteristics of the proposed structure and compare with the conventional structure. As a result, the proposed structure exhibits 49.5% enhancement in gate-charge Qg as compared with the conventional structure, without degrading the other electrical characteristics.
Keywords
p-n junctions; power MOSFET; semiconductor device models; 2D device simulator; ATLAS; gate charge; novel trench power MOSFET structure; p-n junction; Doping; Junctions; Logic gates; MOSFET; Performance evaluation; Switches; Threshold voltage; Trench MOSFET; gate-charge; switching speed; trench MOSFET;
fLanguage
English
Journal_Title
Electron Device Letters, IEEE
Publisher
ieee
ISSN
0741-3106
Type
jour
DOI
10.1109/LED.2014.2382112
Filename
6994833
Link To Document