DocumentCode
1058574
Title
Temperature dependence of MOSFET characteristics in weak inversion
Author
Nishida, Masanori ; Ohyabu, Hiroyuki
Author_Institution
Tokyo Sanyo Electric Company, Ltd., Gumma-ken, Japan
Volume
24
Issue
10
fYear
1977
fDate
10/1/1977 12:00:00 AM
Firstpage
1245
Lastpage
1248
Abstract
A knowledge of the MOSFET operating in weak inversion is important for circuits with low leakage specifications. This paper discusses the effect of temperature on the MOSFET in weak inversion. The reciprocal slope
of the log IDS versus VGS relationship between source-drain current IDS and gate bias VGS may be given by
with
and γ ≡
, where Cox is the oxide capacitance per unit area, Css the surface states capacitance per unit area,
the electronic charge, εs the permittivity of silicon, NB the bulk doping concentration,
the Boltzmann\´s constant,
the absolute temperature, and
the extrapolated value of the energy gap of lightly doped silicon at
K. This theoretical formula was in good agreement with experimental results in a temperature range of interest.
of the log I
with
and γ ≡
, where C
the electronic charge, ε
the Boltzmann\´s constant,
the absolute temperature, and
the extrapolated value of the energy gap of lightly doped silicon at
K. This theoretical formula was in good agreement with experimental results in a temperature range of interest.Keywords
Capacitance; Doping; Intrusion detection; MOSFET circuits; Niobium; Permittivity; Silicon; Temperature dependence; Temperature distribution; Voltage;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/T-ED.1977.18987
Filename
1479179
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