• DocumentCode
    1058574
  • Title

    Temperature dependence of MOSFET characteristics in weak inversion

  • Author

    Nishida, Masanori ; Ohyabu, Hiroyuki

  • Author_Institution
    Tokyo Sanyo Electric Company, Ltd., Gumma-ken, Japan
  • Volume
    24
  • Issue
    10
  • fYear
    1977
  • fDate
    10/1/1977 12:00:00 AM
  • Firstpage
    1245
  • Lastpage
    1248
  • Abstract
    A knowledge of the MOSFET operating in weak inversion is important for circuits with low leakage specifications. This paper discusses the effect of temperature on the MOSFET in weak inversion. The reciprocal slope n of the log IDSversus VGSrelationship between source-drain current IDSand gate bias VGSmay be given by {1 \\over (n - 1 - \\gamma )^{2}} = {2C_{ox}^{2} \\over q\\epsilon_{s}N_{B}} \\Bigg[ {3 \\over 4} {E_{g^{0}} \\over q} - \\Bigg( {3 \\over 2}\\alpha + {k \\over q} \\Bigg) T \\Bigg] with \\alpha \\equiv (k/q)(38.2 - \\ln N_{B} + (3/2) \\ln T) and γ ≡ C_{ss}/C_{ox} , where Coxis the oxide capacitance per unit area, Cssthe surface states capacitance per unit area, q the electronic charge, εsthe permittivity of silicon, NBthe bulk doping concentration, k the Boltzmann\´s constant, T the absolute temperature, and E_{g0} the extrapolated value of the energy gap of lightly doped silicon at T = 0 K. This theoretical formula was in good agreement with experimental results in a temperature range of interest.
  • Keywords
    Capacitance; Doping; Intrusion detection; MOSFET circuits; Niobium; Permittivity; Silicon; Temperature dependence; Temperature distribution; Voltage;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/T-ED.1977.18987
  • Filename
    1479179