DocumentCode :
1059541
Title :
Subthreshold conduction in MOSFET´s
Author :
Taylor, Geoffrey W.
Author_Institution :
Texas Instruments Inc., Dallas, TX
Volume :
25
Issue :
3
fYear :
1978
fDate :
3/1/1978 12:00:00 AM
Firstpage :
337
Lastpage :
350
Abstract :
The dependence of channel current in subthreshold operation upon drain, gate, and substrate voltages is formulated in terms of a simple model. The basic results are consistent with earlier approaches for long-channel devices. For short-channel devices, the variation of current with drain voltage up to the punch-through voltage is accurately described. The threshold voltage of a short-channel device as a function of applied voltages follows as a natural result of the derivation. Results are presented which confirm the theory over a wide range of drain and gate voltages. With the application of substrate bias it is concluded from the data and the theory that two-dimensional effects can cause dramatic increases in the drain conductance.
Keywords :
Charge coupled devices; Circuits; Current density; Electrons; Instruments; MOS devices; Signal design; Silicon; Subthreshold current; Threshold voltage;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/T-ED.1978.19079
Filename :
1479473
Link To Document :
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