Title :
Subthreshold conduction in MOSFET´s
Author :
Taylor, Geoffrey W.
Author_Institution :
Texas Instruments Inc., Dallas, TX
fDate :
3/1/1978 12:00:00 AM
Abstract :
The dependence of channel current in subthreshold operation upon drain, gate, and substrate voltages is formulated in terms of a simple model. The basic results are consistent with earlier approaches for long-channel devices. For short-channel devices, the variation of current with drain voltage up to the punch-through voltage is accurately described. The threshold voltage of a short-channel device as a function of applied voltages follows as a natural result of the derivation. Results are presented which confirm the theory over a wide range of drain and gate voltages. With the application of substrate bias it is concluded from the data and the theory that two-dimensional effects can cause dramatic increases in the drain conductance.
Keywords :
Charge coupled devices; Circuits; Current density; Electrons; Instruments; MOS devices; Signal design; Silicon; Subthreshold current; Threshold voltage;
Journal_Title :
Electron Devices, IEEE Transactions on
DOI :
10.1109/T-ED.1978.19079