DocumentCode
1059641
Title
Silicon lattice measurement with an improved X-ray/optical interferometer
Author
Nakayama, Kan ; Fujimoto, Hiroyuki ; Tanaka, Mitsuru ; Kuroda, Kazuaki
Author_Institution
Nat. Res. Lab. of Metrol., Ibaraki, Japan
Volume
42
Issue
2
fYear
1993
fDate
4/1/1993 12:00:00 AM
Firstpage
401
Lastpage
404
Abstract
An X-ray/optical interferometer (XROI) with a new translation stage was constructed and a preliminary measurement was made of the (220) lattice spacing of a silicon crystal in air. The current status of the measurement is reported
Keywords
X-ray apparatus; computerised instrumentation; electromagnetic wave interferometers; elemental semiconductors; lattice constants; light interferometers; silicon; spatial variables measurement; (220) lattice spacing; Avogadro constant; Si; X-ray/optical interferometer; air; semiconductor; translation stage; Density measurement; Electromagnetic measurements; Laboratories; Lattices; Metrology; Optical filters; Optical interferometry; Optical sensors; Silicon; X-ray lasers;
fLanguage
English
Journal_Title
Instrumentation and Measurement, IEEE Transactions on
Publisher
ieee
ISSN
0018-9456
Type
jour
DOI
10.1109/19.278590
Filename
278590
Link To Document