DocumentCode :
1059641
Title :
Silicon lattice measurement with an improved X-ray/optical interferometer
Author :
Nakayama, Kan ; Fujimoto, Hiroyuki ; Tanaka, Mitsuru ; Kuroda, Kazuaki
Author_Institution :
Nat. Res. Lab. of Metrol., Ibaraki, Japan
Volume :
42
Issue :
2
fYear :
1993
fDate :
4/1/1993 12:00:00 AM
Firstpage :
401
Lastpage :
404
Abstract :
An X-ray/optical interferometer (XROI) with a new translation stage was constructed and a preliminary measurement was made of the (220) lattice spacing of a silicon crystal in air. The current status of the measurement is reported
Keywords :
X-ray apparatus; computerised instrumentation; electromagnetic wave interferometers; elemental semiconductors; lattice constants; light interferometers; silicon; spatial variables measurement; (220) lattice spacing; Avogadro constant; Si; X-ray/optical interferometer; air; semiconductor; translation stage; Density measurement; Electromagnetic measurements; Laboratories; Lattices; Metrology; Optical filters; Optical interferometry; Optical sensors; Silicon; X-ray lasers;
fLanguage :
English
Journal_Title :
Instrumentation and Measurement, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9456
Type :
jour
DOI :
10.1109/19.278590
Filename :
278590
Link To Document :
بازگشت