Title :
High Aspect Ratio Vertical Cantilever RF-MEMS Variable Capacitor
Author :
Klymyshyn, David M. ; Haluzan, Darcy T. ; Börner, Martin ; Achenbach, Sven ; Mohr, Jürgen ; Mappes, Timo
Author_Institution :
Dept. of Electr. Eng., Saskatchewan Univ., Saskatoon, Sask.
Abstract :
An electrostatically actuated, microwave microelectromechanical system variable capacitor fabricated using deep X-ray lithography is presented. A single exposure has been used to produce the novel high aspect ratio microstructure, which includes a thin, vertically oriented, movable nickel cantilever beam and a 40:1 vertical aspect ratio capacitance gap. The 0.8-pF capacitor operates in the 1-5GHz region and has Q-factors of 36 at 4GHz and 133 at 2 GHz. The variable capacitance ratio is 1.24:1 over a 20-V tuning range at 4GHz
Keywords :
UHF devices; cantilevers; capacitors; micromechanical devices; microwave devices; 1 to 5 GHz; RF MEMS; X-ray lithography; aspect ratio; microelectromechanical devices; micromachining; microwave devices; microwave switches; varactors; variable capacitor; vertical cantilever; Capacitance; Capacitors; Electrodes; Microelectromechanical systems; Microstructure; Microwave devices; Radio frequency; Radiofrequency microelectromechanical systems; Space technology; X-ray lithography; Capacitors; X-ray lithography; microelectromechanical devices; micromachining; microwave devices; microwave switches; varactors;
Journal_Title :
Microwave and Wireless Components Letters, IEEE
DOI :
10.1109/LMWC.2006.890338
