Title :
Ultra-stable sapphire resonator-oscillator
Author :
Luiten, Andre N. ; Mann, Anthony G. ; Giles, A.J. ; Blair, David G.
Author_Institution :
Western Australia Univ., Nedlands, WA, Australia
fDate :
4/1/1993 12:00:00 AM
Abstract :
Preliminary measurements of the properties of cryogenic sapphire resonators with various concentrations of paramagnetic impurities are reported. These resonators are mounted in both copper and niobium shields. It is found that one can achieve extrema in the frequency-temperature function in the temperature range 5-18 K due to the compensating effects of the dielectric constant temperature dependence and the Curie law dependence on the susceptibility of the paramagnetic impurities. In samples where dominant paramagnetic impurity has a high ESR (electron spin resonance) unloaded resonator Q factors as high as 4×109 are observed. The increased Q factors coupled with reduced shield interactions should result in an improvement in frequency stability for an oscillator based around this resonator as compared to the best results achieved to date as the authors´ laboratory (an Allan variance of 9×10-15). The preliminary measurement of the tilt sensitivity of the oscillator is reported to be a fractional frequency shift of 6.5×10-12 per degree
Keywords :
Q-factor; crystal resonators; frequency stability; low-temperature techniques; paramagnetic properties of substances; paramagnetic resonance; sapphire; 5 to 18 K; Al2O3; Allan variance; Cu shields; Curie law; ESR; Nb shields; compensating effects; dielectric constant temperature dependence; electron spin resonance; fractional frequency shift; frequency stability; frequency standards; frequency-temperature function; microwave oscillators; paramagnetic impurities; sapphire resonator-oscillator; shield interactions; susceptibility; tilt sensitivity; unloaded resonator Q factors; Copper; Cryogenics; Frequency; Impurities; Niobium; Oscillators; Paramagnetic materials; Paramagnetic resonance; Temperature dependence; Temperature distribution;
Journal_Title :
Instrumentation and Measurement, IEEE Transactions on