Title :
Development of Nb/Al-oxide/Nb Josephson junction array at KRISS [voltage standard]
Author :
Park, Se, II ; Kim, Kyu-Tae ; Lee, Yong Ho ; Lee, Rae Duk
Author_Institution :
Korea Res. Inst. of Stand. & Sci., Taejon, South Korea
fDate :
4/1/1993 12:00:00 AM
Abstract :
By using the selective niobium anodization process (SNAP) an all refractory 210-junction array was fabricated at KRISS. The array consists of Nb/Al-oxide/Nb junctions that have A=20 μm×40 μm. Vg=2.8 mV, an average critical current ≈650 μA, and the spread of critical currents ≈±5%. When operated at 94 GHz, the array generated zero-crossing steps up to 240 mV with stability times of more than 1 h
Keywords :
Josephson effect; anodisation; integrated circuit technology; measurement standards; niobium; superconducting integrated circuits; superconducting junction devices; type II superconductors; voltage measurement; 1 hour; 240 mV; 650 muA; 94 GHz; Josephson junction array; Nb-Al2O3-Nb; anodization; critical current; stability times; voltage standard; zero-crossing steps; Dielectrics; Equations; Frequency; Josephson junctions; Niobium; Stability; Standards development; Stripline; Temperature; Voltage;
Journal_Title :
Instrumentation and Measurement, IEEE Transactions on
