DocumentCode
1060574
Title
A New Flexible Algorithm for Random Yield Improvement
Author
Sinha, Subarna ; Su, Qing ; Wen, Linni ; Lee, Frank ; Chiang, Charles ; Cheng, Yi-kan ; Lin, Jin-Lien ; Harn, Yu-Chyi
Author_Institution
Synopsys Inc., Mountain View
Volume
21
Issue
1
fYear
2008
Firstpage
14
Lastpage
21
Abstract
This paper presents a new and improved solution for random yield improvement at the post-routing stage. The proposed solution is better suited for current processes, where a clustering effect has been observed resulting in differing particle densities in the metal and empty regions of the chip. To account for this clustering effect, we introduce the concept of weighted critical area to serve as a proxy for random yield loss. A new algorithm for weighted critical area minimization is also introduced. The proposed optimization solution derives a weighted critical area based on the user-specified particle densities. It then uses this weighted critical area information to dynamically select the appropriate critical area reduction technique in each local region to guarantee a reduction of the weighted critical area in both the local region and the whole layer. This makes the algorithm flexible and readily applicable to different process lines. It consistently improves the random yield irrespective of the particle densities in the metal and empty regions of the chip.
Keywords
integrated circuit layout; integrated circuit yield; minimisation; clustering effect; flexible algorithm; integrated circuit yield; layout optimisation; post-routing stage; random yield improvement; user-specified particle densities; weighted critical area minimization; Clustering algorithms; Contamination; Large scale integration; Lithography; Manufacturing; Minimization methods; Particle measurements; Robustness; Very large scale integration; Wire; Average critical area; critical area; layout optimization; wire spreading; wire widening; yield improvement;
fLanguage
English
Journal_Title
Semiconductor Manufacturing, IEEE Transactions on
Publisher
ieee
ISSN
0894-6507
Type
jour
DOI
10.1109/TSM.2007.913187
Filename
4447312
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