Effects of focusing on third-order nonlinear processes in isotropic media

Author

Bjorklund, Gary C.

Author_Institution

Bell Laboratories, Holmdel, NJ, USA

Volume

Issue

fYear

1975

fDate

6/1/1975 12:00:00 AM

Firstpage

287

Lastpage

296

Abstract

A theoretical analysis of third-order nonlinear interactions of focused laser beams is performed for the processes $\\omega _{1} + \\omega _{2} + \\omega _{3} \\rightarrow \\omega _{4}, \\omega _{1} + \\omega _{2} - \\omega _{3} \\rightarrow \\omega _{4}$ , and $\\omega _{1} - \\omega _{2} - \\omega _{3} \\rightarrow \\omega _{4}$ . The total power and far-field beam profile of the generated radiation is related to the total powers of the fundamental beams, to the tightness and location of the focus, and to the value of the difference between the wave vectors of the generated radiation and driving polarization. The optimum degree of wave-vector mismatch as a function of tightness and location of focus is determined for each of the three processes. The process $\\omega _{1} + \\omega _{2} - \\omega _{3} \\rightarrow \\omega _{4}$ is found to be unique in that it is always optimized by focusing as tightly as possible. Experimental results, which verify the theory for the processes $\\omega _{1} + \\omega _{2} + \\omega _{3} \\rightarrow \\omega _{4}$ and $\\omega _{1} + \\omega _{2} - \\omega _{3} \\rightarrow \\omega _{4}$ , are presented.

Keywords

Circuits; Ellipsometry; Frequency; Laser beams; Laser theory; Microstrip; Plasmas; Polarization; Power generation; Production;

fLanguage

English

Journal_Title

Quantum Electronics, IEEE Journal of

Publisher

ieee

ISSN

0018-9197

Type

jour

DOI

10.1109/JQE.1975.1068619

Filename

1068619

Link To Document

https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=1061120