Title :
Anisotropic etching of silicon
Author :
Bean, K.E. ; Bean, Kenneth E.
Author_Institution :
Texas Instruments, Inc., Dallas, TX
fDate :
10/1/1978 12:00:00 AM
Abstract :
Anisotropic etching of silicon has become an important technology in silicon semiconductor processing during the past ten years. It will continue to gain stature and acceptance as standard processing technology in the next few years. Anisotropic etching of
Keywords :
Anisotropic magnetoresistance; Chemical technology; Electrodes; Electron devices; Frequency; Hafnium; Ink; Integrated circuit technology; Silicon; Wet etching;
Journal_Title :
Electron Devices, IEEE Transactions on
DOI :
10.1109/T-ED.1978.19250
