DocumentCode :
1061381
Title :
Improved performance of GaAs microwave field-effect transistors with low inductance via-connections through the substrate
Author :
D´Asaro, L.A. ; Dilorenzo, James V. ; Fukui, Hatsuaki
Author_Institution :
Bell Laboratories, Murray Hill, NJ
Volume :
25
Issue :
10
fYear :
1978
fDate :
10/1/1978 12:00:00 AM
Firstpage :
1218
Lastpage :
1221
Abstract :
Reduced inductance via-connections to source electrodes through the substrate of GaAs MESFET´s have been fabricated in a reproducible manner by means of etching, electroless gold plating, and electroplating. The short gold-plated source connections reduce the common-lead parasitic source inductance by a large factor, resulting in gain increases of 2 dB at 4 GHz. At higher frequencies, the improvement over conventionally bonded transistors would become more pronounced.
Keywords :
FETs; Fabrication; Gallium arsenide; Inductance; MESFETs; Microwave devices; Plasma applications; Plasma devices; Solid state circuits; Substrates;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/T-ED.1978.19255
Filename :
1479649
Link To Document :
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