DocumentCode
1061559
Title
C-V profiling of GaAs FET films
Author
Wiley, John D.
Author_Institution
University of Wisconsin, Madison, WI
Volume
25
Issue
11
fYear
1978
fDate
11/1/1978 12:00:00 AM
Firstpage
1317
Lastpage
1324
Abstract
The depletion layer capacitance of a Schottky barrier on a GaAs FET film can only be measured in series with the resistance of the undepleted portion of the film. This inherent series resistance may be significant at all values of bias and causes large errors in
profile determinations. By treating the depletion layer capacitance and the series resistance as a distributed
transmission line, it is possible to define an effective series resistance which can be related directly to the resistivity of the film. Using parameters typical of epitaxial films grown for GaAs FET applications, general criteria are developed for the profilability of these films. It is shown that, in general, films with small pinchoff voltages (i.e., films intended for low-noise FET applications)
profile determinations. By treating the depletion layer capacitance and the series resistance as a distributed
transmission line, it is possible to define an effective series resistance which can be related directly to the resistivity of the film. Using parameters typical of epitaxial films grown for GaAs FET applications, general criteria are developed for the profilability of these films. It is shown that, in general, films with small pinchoff voltages (i.e., films intended for low-noise FET applications)Keywords
Application software; Capacitance measurement; Capacitance-voltage characteristics; Conductivity; Electrical resistance measurement; FETs; Gallium arsenide; Schottky barriers; Semiconductor diodes; Voltage;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/T-ED.1978.19272
Filename
1479666
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