DocumentCode :
1061596
Title :
The Computerized use of Transient Thermal Resistance to Avoid Forware Biased Second Breakdown in Transistors
Author :
Locher, Ralph E.
Author_Institution :
General Electric Company Semiconductor Products Department
Issue :
2
fYear :
1971
fDate :
5/1/1971 12:00:00 AM
Firstpage :
55
Lastpage :
61
Abstract :
The power handling capability of any transistor is limited by its peak junction temperature. Equally as important as the more familiar ICBO thermal runaway is a second, thermally related, phenomenon called forward biased second breakdown (S/B). Much has been written on S/B (see Ref. 1 for a thorough description and bibliography) but it is sufficient here to say that S/B is a potentially destructive phenomena that can occur in any bipolar transistor when the energy absorbed exceeds a critical value and creates a hot spot within the pellet. If the temperature of the hot spot is left unchecked, it will eventually cause the space-charge layer to collapse resulting in the transistor assuming a low resistance state.
Keywords :
Capacitance; Electric breakdown; Equations; Power generation; Resistance heating; Silicon; Space heating; Temperature; Thermal conductivity; Thermal resistance;
fLanguage :
English
Journal_Title :
Broadcast and Television Receivers, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9308
Type :
jour
DOI :
10.1109/TBTR1.1971.299558
Filename :
4079910
Link To Document :
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