Title : 
Striped-substrate double-heterostructure lasers
         
        
            Author : 
Burnham, R.D. ; Scifres, D.R. ; Tramontana, J. ; Alimonda, A.S.
         
        
            Author_Institution : 
Xerox Corp., Palo Alto, CA, USA
         
        
        
        
        
            fDate : 
7/1/1975 12:00:00 AM
         
        
        
        
            Abstract : 
A different type of stripe-geometry laser is demonstrated in which current confinement is achieved by selective diffusion of the n-type substrate prior to growth of the GaAs/GaAlAs heterostructure layers. This structure exhibits low room-temperature threshold currents resulting from the small lateral-current spreading from the edges of the stripe. Lowest order transverse-mode operation is achieved for stripe widths of 10μm.
         
        
            Keywords : 
Absorption; DH-HEMTs; Diodes; Fabrication; Gallium arsenide; Geometry; Iron; Ohmic contacts; P-n junctions; Zinc;
         
        
        
            Journal_Title : 
Quantum Electronics, IEEE Journal of
         
        
        
        
        
            DOI : 
10.1109/JQE.1975.1068674