DocumentCode :
1062426
Title :
Distribution of flat-band voltages in laterally nonuniform MIS capacitors and application to a test for nonuniformities
Author :
Chang, C.C. ; Johnson, Walter C.
Author_Institution :
Industrial Technological Research Institute, Hsinchu, Taiwan
Volume :
25
Issue :
12
fYear :
1978
fDate :
12/1/1978 12:00:00 AM
Firstpage :
1368
Lastpage :
1373
Abstract :
Interface states and lateral nonuniformities produce very similar abnormalities in the C-V curves of MIS capacitors. The effect of a laterally nonuniform distribution of fixed charge in the insulator can be characterized by a flat-band-voltage distribution function. Here we present a simple, approximate method for determining this distribution from the quasi-static and high-frequency C-V curves of the capacitor, and we apply the result to a test for distinguishing between interface states and laterally nonuniform fixed charge. The test is based on a principle that is implicit in the results of an analysis previously published by Brews and Lopez; namely, that interface states and lateral nonuniformities cannot produce identical distortions in both the quasi-static and high-frequency C-V curves. The presence of either lateral nonuniformities or interface states can be tested by assuming all C-V distortion to be due to the other cause. The C-V curves are regenerated under this assumption, and discrepancies between the measured and regenerated curves indicate the presence of the effect assumed not to be present.
Keywords :
Capacitance; Capacitance-voltage characteristics; Distortion measurement; Distribution functions; Frequency; Insulation; Interface states; MOS capacitors; Testing; Voltage;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/T-ED.1978.19357
Filename :
1479751
Link To Document :
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