DocumentCode :
1062444
Title :
The heat-flow problem in silicon: An approach to an analytical solution with application to the calculation of thermal instability in bipolar devices
Author :
Heasell, E.L.
Author_Institution :
University of Waterloo, Waterloo, Ont., Canada
Volume :
25
Issue :
12
fYear :
1978
fDate :
12/1/1978 12:00:00 AM
Firstpage :
1382
Lastpage :
1388
Abstract :
The experimental data for the temperature dependence of the thermal conductivity of silicon are reviewed. It is proposed that an empirical formula of the form K = K_{0}/(T-T_{0}) provides a good description of the measurements. The steady-state heat-flow equations are formulated so that the nonlinear heat-flow problem may be solved in terms of an equivalent linear problem. The method is applied in conjunction with an idealized thermal and electrical device model, to calculate the thermal instability boundary (or second breakdown boundary), of a commercial power transistor.
Keywords :
Electric breakdown; Fingers; Geometry; Power transistors; Silicon; Steady-state; Temperature dependence; Temperature distribution; Thermal conductivity; Thermal resistance;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/T-ED.1978.19359
Filename :
1479753
Link To Document :
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