DocumentCode :
1062463
Title :
Optical MTF evaluation for the photolitographic technology
Author :
Nakase, Makoto
Author_Institution :
NEC Toshiba Information Systems, Inc., Kanagawa, Japan
Volume :
25
Issue :
12
fYear :
1978
fDate :
12/1/1978 12:00:00 AM
Firstpage :
1394
Lastpage :
1399
Abstract :
Measurements of the modulation transfer function (MTF) for different photolithographic exposure tools, such as contact, proximity, and projection printers have been made by the Fourier analysis of an exposed and developed positive photoresist profile. Through the obtained MTF data, the optical performance of the tools is presented concerning linewidth accuracy, reduction in developed photoresist thickness, and linewidth variations at steps. The general conclusion is that hard contact printers are superior to commercially available projection printers at present in the trend toward smaller pattern geometries.
Keywords :
Equations; Geometrical optics; Lenses; Lithography; Microelectronics; Optical imaging; Optical modulation; Optical scattering; Printers; Resists;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/T-ED.1978.19361
Filename :
1479755
Link To Document :
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