DocumentCode
1063371
Title
Analytical models of threshold voltage and breakdown voltage of short-channel MOSFET´s derived from two-dimensional analysis
Author
Toyabe, Toru ; Asai, Shojiro
Author_Institution
Hitachi, Ltd., Tokyo, Japan
Volume
26
Issue
4
fYear
1979
fDate
4/1/1979 12:00:00 AM
Firstpage
453
Lastpage
461
Abstract
Analytical models of threshold voltage and breakdown voltage of short-channel MOSFET´s are derived from the combination of analytical consideration and two-dimensional numerical analysis. An approximate analytical solution for the surface potential is used to derive the threshold voltage, in contrast with the charge conservation approach which has been usually taken. It is shown that the surface potential depends exponentially on the distance from the drain, and this causes the threshold voltage to decrease exponentially with decreasing channel length. The analytical dependence of threshold voltage on device dimensions, doping, and operating conditions is verified by accurate two-dimensional calculations, and the accuracy of the model is attained by slight modification. The breakdown voltage of a short-channel n-MOSFET is lowered by a positive feedback effect of excess substrate current. From two-dimensional analysis of this mechanism, a simple expression of the breakdown voltage is derived. Using this model, the scaling down of MOSFET´s is discussed. The simple models of threshold and breakdown voltage of short-channel MOSFET´s are helpful both for circuit-oriented analysis and process diagnosis where statistical use of the model is often needed.
Keywords
Accuracy; Analytical models; Circuit analysis; Difference equations; Doping; MOSFET circuits; Numerical analysis; Poisson equations; Semiconductor process modeling; Threshold voltage;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/T-ED.1979.19448
Filename
1480026
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