DocumentCode :
1063632
Title :
A pseudo-lucky electron model for simulation of electron gate current in submicron NMOSFET´s
Author :
Hasnat, K. ; Yeap, C.-F. ; Jallepalli, S. ; Shih, W.-K. ; Hareland, S.A. ; Agostinelli, V.M., Jr. ; Tasch, A.F., Jr. ; Maziar, C.M.
Author_Institution :
Dept. of Electr. & Comput. Eng., Texas Univ., Austin, TX, USA
Volume :
43
Issue :
8
fYear :
1996
Firstpage :
1264
Lastpage :
1273
Abstract :
An energy parameterized pseudo-lucky electron model for simulation of gate current in submicron MOSFET´s is presented in this paper. The model uses hydrodynamic equations to describe more correctly the carrier energy dependence of the gate injection phenomenon. The proposed model is based on the exponential form of the conventional lucky electron gate current model. Unlike the conventional lucky electron model, which is based on the local electric fields in the device, the proposed model accounts for nonlocal effects resulting from the large variations in the electric field in submicron MOSFET´s. This is achieved by formulating the lucky electron model in terms of an effective-electric field that is obtained by using the computed average carrier energy in the device and the energy versus field relation obtained from uniform-field Monte Carlo simulations. Good agreement with gate currents over a wide range of bias conditions for three sets of devices is demonstrated.
Keywords :
MOSFET; Monte Carlo methods; carrier lifetime; hot carriers; semiconductor device models; average carrier energy; bias conditions; carrier energy dependence; effective-electric field; electron gate current; exponential form; gate injection phenomenon; hydrodynamic equations; nonlocal effects; pseudo-lucky electron model; submicron NMOSFET; uniform-field Monte Carlo simulations; Charge carrier processes; Current measurement; Electron traps; Equations; Hot carriers; Hydrodynamics; MOSFET circuits; Microelectronics; Monitoring; Substrates;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/16.506778
Filename :
506778
Link To Document :
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