DocumentCode
1063836
Title
An alternative to angle lap and stain analysis of Gaussian diffusions
Author
Guckel, Henry ; Thomas, Dooie C. ; Demirkol, Adnan
Author_Institution
University of Wisconsin, Madison, WI
Volume
26
Issue
5
fYear
1979
fDate
5/1/1979 12:00:00 AM
Firstpage
776
Lastpage
779
Abstract
The junction depth and surface concentration for a Gaussian diffusion into a known uniform background can be determined by measuring the depletion layer capacitance and the sheet resistance. A family of sheet resistance versus depletion layer capacitance curves is computed. They facilitate the direct conversion of experimental data to diffusion data. The technique offers a fast, accurate, nondestructive technique for the analysis of Gaussian diffusions.
Keywords
Capacitance; Electrical resistance measurement; Equations; Gaussian distribution; Gaussian processes; Impurities; Niobium; Surface resistance; Testing; Voltage;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/T-ED.1979.19492
Filename
1480070
Link To Document