• DocumentCode
    1063836
  • Title

    An alternative to angle lap and stain analysis of Gaussian diffusions

  • Author

    Guckel, Henry ; Thomas, Dooie C. ; Demirkol, Adnan

  • Author_Institution
    University of Wisconsin, Madison, WI
  • Volume
    26
  • Issue
    5
  • fYear
    1979
  • fDate
    5/1/1979 12:00:00 AM
  • Firstpage
    776
  • Lastpage
    779
  • Abstract
    The junction depth and surface concentration for a Gaussian diffusion into a known uniform background can be determined by measuring the depletion layer capacitance and the sheet resistance. A family of sheet resistance versus depletion layer capacitance curves is computed. They facilitate the direct conversion of experimental data to diffusion data. The technique offers a fast, accurate, nondestructive technique for the analysis of Gaussian diffusions.
  • Keywords
    Capacitance; Electrical resistance measurement; Equations; Gaussian distribution; Gaussian processes; Impurities; Niobium; Surface resistance; Testing; Voltage;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/T-ED.1979.19492
  • Filename
    1480070