DocumentCode :
1063836
Title :
An alternative to angle lap and stain analysis of Gaussian diffusions
Author :
Guckel, Henry ; Thomas, Dooie C. ; Demirkol, Adnan
Author_Institution :
University of Wisconsin, Madison, WI
Volume :
26
Issue :
5
fYear :
1979
fDate :
5/1/1979 12:00:00 AM
Firstpage :
776
Lastpage :
779
Abstract :
The junction depth and surface concentration for a Gaussian diffusion into a known uniform background can be determined by measuring the depletion layer capacitance and the sheet resistance. A family of sheet resistance versus depletion layer capacitance curves is computed. They facilitate the direct conversion of experimental data to diffusion data. The technique offers a fast, accurate, nondestructive technique for the analysis of Gaussian diffusions.
Keywords :
Capacitance; Electrical resistance measurement; Equations; Gaussian distribution; Gaussian processes; Impurities; Niobium; Surface resistance; Testing; Voltage;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/T-ED.1979.19492
Filename :
1480070
Link To Document :
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