• DocumentCode
    1064340
  • Title

    High-Temperature Operation of 1.26- \\mu m Ridge Waveguide Laser With InGaAs Metamorphic Buffer on GaAs Substrate

  • Author

    Arai, Masakazu ; Nakashima, Kiichi ; Fujisawa, Takeshi ; Tadokoro, Takashi ; Kobayashi, Wataru ; Yuda, Masahiro ; Kondo, Yasuhiro

  • Author_Institution
    Nippon Telegraph & Telephone (NTT) Photonics Labs., NTT Corp., Atsugi
  • Volume
    15
  • Issue
    3
  • fYear
    2009
  • Firstpage
    724
  • Lastpage
    730
  • Abstract
    In this paper, we have newly developed an InGaAs metamorphic buffer on a GaAs substrate grown by metal-organic vapor-phase epitaxy, and realized a fully relaxed quasi-InGaAs substrate with low threading dislocation density. We have also successfully developed a 1.3-mu m-range ridge waveguide laser with InGaP upper cladding and InAlGaAs lower cladding layers. This laser has achieved the highest continuous-wave operating temperature (173degC) reported for a metamorphic laser. We measured the relaxation oscillation frequency from the relative intensity noise and undertook a 10-Gb/s direct modulation experiment.
  • Keywords
    MOCVD; dislocation density; gallium arsenide; indium compounds; semiconductor lasers; waveguide lasers; InGaAs; cladding layers; low threading dislocation density; metal-organic vapor-phase epitaxy; metamorphic buffer; ridge waveguide laser; temperature 173 degC; wavelength 1.26 micron; wavelength 1.3 micron; Epitaxial growth; Frequency measurement; Gallium arsenide; Indium gallium arsenide; Intensity modulation; Laser noise; Noise measurement; Substrates; Temperature; Waveguide lasers; InGaAs; laser; metamorphic; uncooled;
  • fLanguage
    English
  • Journal_Title
    Selected Topics in Quantum Electronics, IEEE Journal of
  • Publisher
    ieee
  • ISSN
    1077-260X
  • Type

    jour

  • DOI
    10.1109/JSTQE.2008.2011564
  • Filename
    5068479