• DocumentCode
    1064411
  • Title

    Relation between oxide thickness and the breakdown voltage of a planar junction with field relief electrode

  • Author

    O´Neil, V.P. ; Alonas, Paul G.

  • Author_Institution
    Motorola Semiconductor Products, Inc., Phoenix, AZ
  • Volume
    26
  • Issue
    7
  • fYear
    1979
  • fDate
    7/1/1979 12:00:00 AM
  • Firstpage
    1098
  • Lastpage
    1100
  • Abstract
    A semitheoretical relationship has been developed between the surface breakdown of a planar junction protected by an overlaying field plate and its description in terms of resistivity and oxide thickness. This has been confirmed experimentally on p+-n diodes in 45-Ω . cm material for a wide range of oxide thicknesses.
  • Keywords
    Breakdown voltage; Conductivity; Dielectrics; Electric breakdown; Electrodes; P-n junctions; Permittivity; Protection; Semiconductor diodes; Silicon;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/T-ED.1979.19552
  • Filename
    1480130