DocumentCode :
1065729
Title :
Electrical trimming of heavily doped polycrystalline silicon resistors
Author :
Amemiya, Yoshihito ; Ono, Terukazu ; Kato, Kotaro
Author_Institution :
Nippon Telegraph and Telephone Public Corporation, Musashino-shi, Tokyo, Japan
Volume :
26
Issue :
11
fYear :
1979
fDate :
11/1/1979 12:00:00 AM
Firstpage :
1738
Lastpage :
1742
Abstract :
The newly discovered phenomenon of resistance decrease in heavily doped polycrystalline silicon resistors by conduction of high current densiy has been investigated experimentally. Threshold values exist for the impurity concentration and for the applied current density for the occurrence of this phenomenon. Decreased resistance is stable as far as current higher than the threshold value is not applied thereafter. Applications to D/A converters and operational amplifiers are described. Electrical trimming of resistors in the circuits with accuracy of ±0.01 percent is easily attained.
Keywords :
Crystallization; Current density; Doping; Electric resistance; Electrodes; Impurities; Resistors; Silicon; Space vector pulse width modulation; Thermal resistance;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/T-ED.1979.19679
Filename :
1480257
Link To Document :
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