Transient refractive index measurements in XeF laser gas mixtures

Author

Fulghum, Stephen F. ; Trainor, Daniel W. ; Appel, Craig H.

Author_Institution

Avco Res. Lab., Everett, MA, USA

Volume

25

Issue

5

fYear

1989

fDate

5/1/1989 12:00:00 AM

Firstpage

955

Lastpage

962

Abstract

Transient refractive index (TRI) measurements made in e-beam-pumped XeF laser gas mixtures as a function of energy loading are discussed. Both NF₃ and F₂ were used as halogen donors in a neon base. TRI due to halogen donor burnup and to plasma dispersion was measured at 578.4 nm in typical laser mixtures containing Xe and at 353.2 nm in mixtures without Xe. The net index of refraction of the mixtures decreased with increasing energy loading, resulting in a difference of about 50×10^-9 to 100×10^-9 between pumped and unpumped region at a typical loading of 150 J/1.

Keywords

electron beam effects; excimer lasers; gas mixtures; refractive index measurement; xenon compounds; 353.2 nm; 578.4 nm; F₂; NF₃; Ne₂; XeF laser; e-beam-pumped; energy loading; gas mixtures; halogen donor burnup; halogen donors; net index of refraction; plasma dispersion; pumped region; transient refractive index measurements; unpumped region; Acoustic beams; Dispersion; Gas lasers; Kinetic theory; Laboratories; Laser beams; Laser excitation; Plasma measurements; Pump lasers; Refractive index;

fLanguage

English

Journal_Title

Quantum Electronics, IEEE Journal of

Publisher

ieee

ISSN

0018-9197

Type

jour

DOI

10.1109/3.27986

Filename

27986