Title :
MA-3 applications of scanning CW laser and electron beams for silicon device processing
fDate :
11/1/1979 12:00:00 AM
Keywords :
Annealing; CMOS technology; Electron beams; Laboratories; MOSFET circuits; Power dissipation; Pulsed laser deposition; Ring lasers; Silicon devices; Very large scale integration;
Journal_Title :
Electron Devices, IEEE Transactions on
DOI :
10.1109/T-ED.1979.19694
