DocumentCode :
1066673
Title :
WP-A2 Effects of Cr redistribution on device characteristics in ion-implanted GaAs IC´s fabricated with semi-insulating GaAs
Author :
Asbeck, P. ; Tandon, J. ; Babcock, E. ; Welch, Benjamin ; Deline, V.R.
Volume :
26
Issue :
11
fYear :
1979
fDate :
11/1/1979 12:00:00 AM
Firstpage :
1853
Lastpage :
1853
Keywords :
Annealing; Capacitance-voltage characteristics; Chromium; Displays; Electric variables; Gallium arsenide; Insulation; Integrated circuit measurements; Passivation; Surface treatment;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/T-ED.1979.19771
Filename :
1480349
Link To Document :
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