• DocumentCode
    1067455
  • Title

    Low temperature annealing of ion-implanted KNbO3 channel waveguides

  • Author

    Pliska, T. ; Jundt, D.H. ; Fluck, D. ; Gunter, P. ; Fleuster, M. ; Buchal, C.

  • Author_Institution
    Inst. of Quantum Electron., Swiss Federal Inst. of Technol., Zurich
  • Volume
    30
  • Issue
    7
  • fYear
    1994
  • fDate
    3/31/1994 12:00:00 AM
  • Firstpage
    562
  • Lastpage
    563
  • Abstract
    Ion implanted KNbO3 channel waveguides were annealed at 150°C for several hours. The waveguide losses were considerably reduced at visible and near-infrared wavelengths showing a minimum loss coefficient of 1.7 dB cm-1 at 633 nm. No significant change of the refractive index profile was observed
  • Keywords
    annealing; integrated optics; ion implantation; optical losses; optical waveguides; potassium compounds; refractive index; 150 C; 633 nm; KNbO3; KNbO3 channel waveguides; NIR; annealed; ion-implanted; low temperature annealing; minimum loss coefficient; near-infrared wavelengths; refractive index profile; visible wavelengths; waveguide losses;
  • fLanguage
    English
  • Journal_Title
    Electronics Letters
  • Publisher
    iet
  • ISSN
    0013-5194
  • Type

    jour

  • DOI
    10.1049/el:19940392
  • Filename
    280600
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=1067455